Title: Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition
Type: Journal
Info: Acta Phys. Sin. Vol. 66, No. 9 (2017) 098101
Date: 2017-02-06
DOI: http://dx.doi.org/10.7498/aps.66.098101
Name
Institution
Shandong University
Institute of Microelectronics of Chinese Academy of Sciences
Jiaxing Microelectronic Equipment
Shandong University
Institute of Microelectronics of Chinese Academy of Sciences
Characteristic
Analysis
Diagnostic
Thickness
Ellipsometry
Unknown
Crystallinity, Crystal Structure, Grain Size, Atomic Structure
XRD, X-Ray Diffraction
Unknown
Chemical Composition, Impurities
XPS, X-ray Photoelectron Spectroscopy
Unknown
Bonding States
XPS, X-ray Photoelectron Spectroscopy
Unknown
Si(100)
Chinese paper with English abstract and figure labels
1119
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