Protective capping and surface passivation of III-V nanowires by atomic layer deposition

Type:
Journal
Info:
AIP ADVANCES 6, 015016 (2016)
Date:
2016-01-18

Author Information

Name Institution
Veer DhakaAalto University
Alexander Pyymaki PerrosAalto University
Shagufta NaureenThe Australian National University
Naeem ShahidThe Australian National University
Hua JiangAalto University
Joona-Pekko KakkoAalto University
Tuomas HaggrenAalto University
Esko KauppinenAalto University
Anand SrinivasanKTH Royal Institute of Technology
Harri LipsanenAalto University

Films

Plasma AlN


Thermal TiN


Thermal Al2O3


Plasma GaN


Thermal TiO2


Film/Plasma Properties

Characteristic: Images
Analysis: TEM, Transmission Electron Microscope

Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy

Characteristic: Photoluminescence
Analysis: PL, PhotoLuminescence

Substrates

GaAs
InP

Notes

1397