RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
Type:
Conference Proceedings
Info:
IEICE Tech. Rep., vol. 114, no. 202, CPM2014-86, pp. 59-64, Sept. 2014
Date:
2014-08-28
Author Information
Name | Institution |
---|---|
P. Pungboon Pansila | Yamagata University |
Kensaku Kanomata | Yamagata University |
Bashir Ahmmad | Yamagata University |
Shigeru Kubota | Yamagata University |
Fumihiko Hirose | Yamagata University |
Films
Film/Plasma Properties
Characteristic: Deposition Kinetics, Reaction Mechanism
Analysis: IRAS, Infrared Reflection Absorption Spectroscopy
Substrates
Notes
562 |