Kensaku Kanomata Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Kensaku Kanomata returned 16 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
2Room temperature atomic layer deposition of TiO2 on gold nanoparticles
3Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
4Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
5RT Atomic Layer Deposition of Al2O3 By Using Remote Plasma Excited Water Vapor
6Growth kinetics for temperature-controlled atomic layer deposition of GaN using trimethylgallium and remote-plasma-excited NH3
7Infrared study on low temperature atomic layer deposition of GaN using trimethylgallium and plasma-excited ammonia
8Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
9RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
10Temperature-controlled atomic layer deposition of GaN using plasma-excited nitrogen source
11Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
12RT Atomic Layer Deposition of ZrO2 By Using Plasma Excited Water Vapor
13Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon
14Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
15Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
16Room-Temperature Atomic Layer Deposition of HfO2 By Using Remote Plasma Source