Search 1536 plasma ALD publications by:
Search 1536 plasma ALD publications by:
Publication Information
Title:
RT Atomic Layer Deposition of Al2O3 By Using Remote Plasma Excited Water Vapor
Type:
Poster
Info:
227th ECS Meeting May 24, 2015 - May 28, 2015 Chicago, IL, MA2015-01 2274
Date:
2015-05-27
Author Information
Name | Institution |
---|---|
Kensaku Kanomata | Yamagata University |
P. Pungboon Pansila | Yamagata University |
Hisashi Ohba | Yamagata University |
Bashir Ahmmad | Yamagata University |
Shigeru Kubota | Yamagata University |
Kazuhiro Hirahara | Yamagata University |
Fumihiko Hirose | Yamagata University |
Films
Film/Plasma Properties
Characteristic: Deposition Kinetics, Reaction Mechanism
Analysis: IRAS, Infrared Reflection Absorption Spectroscopy
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Barrier Characteristics
Analysis: -
Substrates
Si(100) |
Keywords
Diffusion Barrier |
Corrosion |
Notes
526 |
Popular Precursors
Top Authors
Erwin (W.M.M.) Kessels |
Hyeongtag Jeon |
Hyungjun Kim |
Mauritius C. M. (Richard) van de Sanden |
Christophe Detavernier |