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Publication Information

Title: RT Atomic Layer Deposition of Al2O3 By Using Remote Plasma Excited Water Vapor

Type: Poster

Info: 227th ECS Meeting May 24, 2015 - May 28, 2015 Chicago, IL, MA2015-01 2274

Date: 2015-05-27

DOI: http://ma.ecsdl.org/content/MA2015-01/43/2274.abstract

Author Information

Name

Institution

Yamagata University

Yamagata University

Yamagata University

Yamagata University

Yamagata University

Yamagata University

Yamagata University

Films

Plasma Al2O3 using Custom

Deposition Temperature = 25C

75-24-1

7732-18-5

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Deposition Kinetics, Reaction Mechanism

IRAS, Infrared Reflection Absorption Spectroscopy

Unknown

Thickness

Ellipsometry

Unknown

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Unknown

Barrier Characteristics

Unknown

Unknown

Substrates

Si(100)

Keywords

Diffusion Barrier

Corrosion

Notes

526

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