Fumihiko Hirose Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Fumihiko Hirose returned 13 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1RT Atomic Layer Deposition of Al2O3 By Using Remote Plasma Excited Water Vapor
2Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
3Infrared study on low temperature atomic layer deposition of GaN using trimethylgallium and plasma-excited ammonia
4RT Atomic Layer Deposition of ZrO2 By Using Plasma Excited Water Vapor
5Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
6Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
7Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
8Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
9Room temperature atomic layer deposition of TiO2 on gold nanoparticles
10Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon
11Growth kinetics for temperature-controlled atomic layer deposition of GaN using trimethylgallium and remote-plasma-excited NH3
12Temperature-controlled atomic layer deposition of GaN using plasma-excited nitrogen source
13RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma