Fumihiko Hirose Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Fumihiko Hirose returned 13 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Temperature-controlled atomic layer deposition of GaN using plasma-excited nitrogen source
2RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
3Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
4Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
5Room temperature atomic layer deposition of TiO2 on gold nanoparticles
6Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
7RT Atomic Layer Deposition of ZrO2 By Using Plasma Excited Water Vapor
8Growth kinetics for temperature-controlled atomic layer deposition of GaN using trimethylgallium and remote-plasma-excited NH3
9Infrared study on low temperature atomic layer deposition of GaN using trimethylgallium and plasma-excited ammonia
10RT Atomic Layer Deposition of Al2O3 By Using Remote Plasma Excited Water Vapor
11Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon
12Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
13Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon