Fumihiko Hirose Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Fumihiko Hirose returned 13 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
2RT Atomic Layer Deposition of Al2O3 By Using Remote Plasma Excited Water Vapor
3Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
4Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
5Infrared study on low temperature atomic layer deposition of GaN using trimethylgallium and plasma-excited ammonia
6Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
7Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
8Growth kinetics for temperature-controlled atomic layer deposition of GaN using trimethylgallium and remote-plasma-excited NH3
9Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon
10Temperature-controlled atomic layer deposition of GaN using plasma-excited nitrogen source
11RT Atomic Layer Deposition of ZrO2 By Using Plasma Excited Water Vapor
12Room temperature atomic layer deposition of TiO2 on gold nanoparticles
13RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma