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An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Room temperature atomic layer deposition of TiO2 on gold nanoparticles

Type:
Journal
Info:
Journal of Vacuum Science & Technology A 35, 01B121 (2017)
Date:
2016-11-22
DOI:
http://dx.doi.org/10.1116/1.4971398

Author Information

Name Institution
Ko KikuchiYamagata University
Masanori MiuraYamagata University
Kensaku KanomataYamagata University
Bashir AhmmadYamagata University
Shigeru KubotaYamagata University
Fumihiko HiroseYamagata University

Films

Plasma TiO2

Hardware used: Custom
TDMATi, tetrakis(dimethylamido)titanium, titanium dimethylamide, (Me2N)4Ti
CAS#: 3275-24-9
Where to buy precursor
Ar, Argon
CAS#: 7440-37-1
H2O, Water
CAS#: 7732-18-5
Where to buy precursor
Deposition Temperature = 25C

Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: JASCO M-220

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: -

Characteristic: Thickness
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: JEOL JSM-7600F

Substrates

Au
Silicon

Notes

903