Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen

Type:
Conference Proceedings
Info:
IEICE Technical Report Vol.115 No.5
Date:
2015-04-09

Author Information

Name Institution
Kensaku KanomataYamagata University
Hisashi OhbaYamagata University
P. Pungboon PansilaYamagata University
Bashir AhmmadYamagata University
Shigeru KubotaYamagata University
Kazuhiro HiraharaYamagata University
Fumihiko HiroseYamagata University

Films

Plasma HfO2


Plasma HfO2


Film/Plasma Properties

Characteristic: Deposition Kinetics, Reaction Mechanism
Analysis: IRAS, Infrared Reflection Absorption Spectroscopy

Characteristic: Thickness
Analysis: Ellipsometry

Substrates

Notes

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