Publication Information

Title: Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen

Type: Conference Proceedings

Info: IEICE Technical Report Vol.115 No.5

Date: 2015-04-09

DOI: http://i-scover.ieice.org/iscover/page/ARTICLE-6390858A-46D9-8415-419A-8056F25485CA

Author Information

Name

Institution

Yamagata University

Yamagata University

Yamagata University

Yamagata University

Yamagata University

Yamagata University

Yamagata University

Films

Plasma HfO2 using Custom

Deposition Temperature = 25C

352535-01-4

7732-18-5

Plasma HfO2 using Custom

Deposition Temperature = 25C

352535-01-4

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Deposition Kinetics, Reaction Mechanism

IRAS, Infrared Reflection Absorption Spectroscopy

Unknown

Thickness

Ellipsometry

Unknown

Substrates

Keywords

Notes

527



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