Publication Information

Title:
Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
Type:
Conference Proceedings
Info:
ECS Meeting Abstracts
Date:
2016-10-05

Author Information

Name Institution
Fumihiko HiroseYamagata University
K. TokoroYamagata University
Kensaku KanomataYamagata University
Masanori MiuraYamagata University
Bashir AhmmadYamagata University
Shigeru KubotaYamagata University

Films

Plasma SnO2


Film/Plasma Properties

Characteristic: Surface Reactions
Analysis: ATR-FTIR

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Thickness
Analysis: Ellipsometry

Substrates

Si(100)

Keywords

TCO, Transparent Conducting Oxide

Notes

872