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TDMASn, Tetrakis[DiMethylAmido]Tin, Tetrakis[DiMethylAmino]Tin, Tin Dimethylamide, [Me2N]4Sn, [(CH3)2N]4Sn, CAS# 1066-77-9

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 8 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Three-Dimensional Solid-State Lithium-Ion Batteries Fabricated by Conformal Vapor-Phase Chemistry
2A New Hole Transport Material for Efficient Perovskite Solar Cells With Reduced Device Cost
3Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
4Cost-effective hole transporting material for stable and efficient perovskite solar cells with fill factors up to 82%
5Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
6Low-bandgap mixed tin-lead iodide perovskite absorbers with long carrier lifetimes for all-perovskite tandem solar cells
7Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
8Water Vapor Treatment of Low-Temperature Deposited SnO2 Electron Selective Layers for Efficient Flexible Perovskite Solar Cells


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