Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition

Type:
Journal
Info:
Ceramics International 47 (2021) 8634-8641
Date:
2020-11-28

Author Information

Name Institution
Chia-Hsun HsuXiamen University
Zhi-Xuan ZhangXiamen University
Pao-Hsun HuangJimei University
Wan-Yu WuDa-Yeh University
Sin-Liang OuDa-Yeh University
Shui-Yang LienXiamen University
Chien-Jung HuangNational University of Kaohsiung
Ming-Kwei LeeJimei University
Wen-Zhang ZhuXiamen University

Films


Film/Plasma Properties

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Bonding States
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Electron Diffraction

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Plasma Species
Analysis: OES, Optical Emission Spectroscopy

Substrates

Silicon

Keywords

Notes

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