Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition

Type:
Journal
Info:
Ceramics International 47 (2021) 8634-8641
Date:
2020-11-28
DOI:
https://doi.org/10.1016/j.ceramint.2020.11.232

Author Information

Name Institution
Chia-Hsun HsuXiamen University
Zhi-Xuan ZhangXiamen University
Pao-Hsun HuangJimei University
Wan-Yu WuDa-Yeh University
Sin-Liang OuDa-Yeh University
Shui-Yang LienXiamen University
Chien-Jung HuangNational University of Kaohsiung
Ming-Kwei LeeJimei University
Wen-Zhang ZhuXiamen University

Films

Plasma SnO2

Hardware used: Picosun R200
TDMASn, (Me2N)4Sn, [(CH3)2N]4Sn, Tetrakis(DiMethylAmido) Tin, Tin Dimethylamide
CAS#: 1066-77-9
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 300C

Film/Plasma Properties

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Diagnostic: Rigaku TTRAX III

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: Thermo Scientific ESCA LAB 250 XPS Spectrometer

Characteristic: Bonding States
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: Thermo Scientific ESCA LAB 250 XPS Spectrometer

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: JEOL JSM-7800F

Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope
Diagnostic: -

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Electron Diffraction
Diagnostic: -

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000

Characteristic: Plasma Species
Analysis: OES, Optical Emission Spectroscopy
Diagnostic: -

Substrates

Silicon

Notes

1584