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Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition
Type:
Journal
Info:
Ceramics International 47 (2021) 8634-8641
Date:
2020-11-28
Author Information
| Name | Institution |
|---|---|
| Chia-Hsun Hsu | Xiamen University |
| Zhi-Xuan Zhang | Xiamen University |
| Pao-Hsun Huang | Jimei University |
| Wan-Yu Wu | Da-Yeh University |
| Sin-Liang Ou | Da-Yeh University |
| Shui-Yang Lien | Xiamen University |
| Chien-Jung Huang | National University of Kaohsiung |
| Ming-Kwei Lee | Jimei University |
| Wen-Zhang Zhu | Xiamen University |
Films
Plasma SnO2
Film/Plasma Properties
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Bonding States
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Electron Diffraction
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Plasma Species
Analysis: OES, Optical Emission Spectroscopy
Substrates
| Silicon |
Notes
| 1584 |