Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Zhi-Xuan Zhang Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Zhi-Xuan Zhang returned 4 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
2Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition
3Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
4Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition