Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
Type:
Journal
Info:
Materials 2021, 14, 690
Date:
2021-01-26
Author Information
| Name | Institution |
|---|---|
| Pao-Hsun Huang | Jimei University |
| Zhi-Xuan Zhang | Xiamen University |
| Chia-Hsun Hsu | Xiamen University |
| Wan-Yu Wu | Da-Yeh University |
| Chien-Jung Huang | National University of Kaohsiung |
| Shui-Yang Lien | Xiamen University |
Films
Plasma SnO2
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Reflectance Spectra
Analysis: UV-VIS Spectroscopy
Characteristic: Transmittance
Analysis: UV-VIS Spectroscopy
Characteristic: Optical Bandgap
Analysis: UV-VIS Spectroscopy
Characteristic: Plasma Species
Analysis: OES, Optical Emission Spectroscopy
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Resistivity, Sheet Resistance
Analysis: Hall Measurements
Characteristic: Carrier Concentration
Analysis: Hall Measurements
Characteristic: Mobility
Analysis: Hall Measurements
Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Substrates
| soda lime glass |
| Si(100) |
Notes
| 1646 |