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An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Wan-Yu Wu Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Wan-Yu Wu returned 5 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
2Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
3Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
4Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
5Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition