Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition

Type:
Journal
Info:
Journal of Vacuum Science & Technology A 39, 032415 (2021)
Date:
2021-04-16

Author Information

Name Institution
Chen WangXiamen University
Chun-Hui BaoXiamen University
Wan-Yu WuDa-Yeh University
Chia-Hsun HsuXiamen University
Ming-Jie ZhaoXiamen University
Shui-Yang LienXiamen University
Wen-Zhang ZhuXiamen University

Films

Plasma MoOx


Film/Plasma Properties

Characteristic: Band Gap
Analysis: UV-VIS Spectroscopy

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Plasma Species
Analysis: OES, Optical Emission Spectroscopy

Substrates

Si(100)
Glass
Quartz

Notes

1564