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Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 39, 032415 (2021)
Date:
2021-04-16
Author Information
| Name | Institution |
|---|---|
| Chen Wang | Xiamen University |
| Chun-Hui Bao | Xiamen University |
| Wan-Yu Wu | Da-Yeh University |
| Chia-Hsun Hsu | Xiamen University |
| Ming-Jie Zhao | Xiamen University |
| Shui-Yang Lien | Xiamen University |
| Wen-Zhang Zhu | Xiamen University |
Films
Plasma MoOx
Film/Plasma Properties
Characteristic: Band Gap
Analysis: UV-VIS Spectroscopy
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Plasma Species
Analysis: OES, Optical Emission Spectroscopy
Substrates
| Si(100) |
| Glass |
| Quartz |
Notes
| 1564 |