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An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
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  • Surface cleaning
  • Surface modification

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Wen-Zhang Zhu Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Wen-Zhang Zhu returned 6 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
2Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition
3Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
4Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
5Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
6Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers