Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Water Vapor Treatment of Low-Temperature Deposited SnO2 Electron Selective Layers for Efficient Flexible Perovskite Solar Cells

Type:
Journal
Info:
ACS Energy Lett. 2017, 2, 2118-2124
Date:
2017-08-21
DOI:
http://dx.doi.org/10.1021/acsenergylett.7b00644

Author Information

Name Institution
Changlei WangUniversity of Toledo
Lei GuanUniversity of Toledo
Dewei ZhaoUniversity of Toledo
Yue YuUniversity of Toledo
Corey R. GriceUniversity of Toledo
Zhaoning SongUniversity of Toledo
Rasha A. AwniUniversity of Toledo
Jing ChenSoutheast University
Jianbo WangWuhan University
Xingzhong ZhaoWuhan University
Yanfa YanUniversity of Toledo

Films

Plasma SnO2

Hardware used: Ensure Scientific Group AutoALD-PE V2.0
TDMASn, (Me2N)4Sn, [(CH3)2N]4Sn, Tetrakis(DiMethylAmido) Tin, Tin Dimethylamide
CAS#: 1066-77-9
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 100C

Film/Plasma Properties

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Diagnostic: -

Characteristic: Transmittance
Analysis: UV-VIS Spectroscopy
Diagnostic: Perkin-Elmer lambda 1050 UV/Vis/NIR

Substrates

ITO

Notes

1149