Publication Information

Title:
Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 36, 01A112 (2018)
Date:
2017-11-09

Author Information

Name Institution
Lukas HoffmannUniversity of Wuppertal
Detlef TheirichUniversity of Wuppertal
Daniel SchlammUniversity of Wuppertal
Tim HasselmannUniversity of Wuppertal
Sven PackUniversity of Wuppertal
Kai Oliver BrinkmannUniversity of Wuppertal
Detlef RogallaRuhr-University Bochum
Sven PetersSentech Instruments GmbH
André RäupkeUniversity of Wuppertal
Hassan GargouriSentech Instruments GmbH
Thomas RiedlUniversity of Wuppertal

Films

Plasma SnO2


Thermal SnO2


Thermal SnO2


Film/Plasma Properties

Characteristic: Carrier Concentration
Analysis: van der Pauw sheet resistance

Characteristic: Resistivity, Sheet Resistance
Analysis: van der Pauw sheet resistance

Characteristic: Mobility
Analysis: Hall Measurements

Characteristic: Water Vapor Transmission Rate (WVTR)
Analysis: Calcium Test

Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry

Characteristic: Density
Analysis: RBS, Rutherford Backscattering Spectrometry

Characteristic: Chemical Composition, Impurities
Analysis: NRA, Nuclear Reaction Analysis

Characteristic: Extinction Coefficient
Analysis: FTIR Spectroscopic Ellipsometry

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Substrates

Silicon
Glass
Calcium

Keywords

Plasma vs Thermal Comparison

Notes

1066