Publication Information

Title: Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier

Type: Journal

Info: Journal of Vacuum Science & Technology A 36, 01A112 (2018)

Date: 2017-11-09

DOI: http://dx.doi.org/10.1116/1.5006781

Author Information

Name

Institution

University of Wuppertal

University of Wuppertal

University of Wuppertal

University of Wuppertal

University of Wuppertal

University of Wuppertal

Ruhr-University Bochum

Sentech Instruments GmbH

University of Wuppertal

Sentech Instruments GmbH

University of Wuppertal

Films

Plasma SnO2 using Custom Spatial

Deposition Temperature Range = 80-165C

1066-77-9

7782-44-7

Thermal SnO2 using Custom Spatial

Deposition Temperature Range = 80-165C

1066-77-9

7732-18-5

Thermal SnO2 using Custom Spatial

Deposition Temperature Range = 80-165C

1066-77-9

10028-15-6

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Carrier Concentration

van der Pauw sheet resistance

Unknown

Resistivity, Sheet Resistance

van der Pauw sheet resistance

Unknown

Mobility

Hall Measurements

Unknown

Water Vapor Transmission Rate (WVTR)

Calcium Test

Unknown

Chemical Composition, Impurities

RBS, Rutherford Backscattering Spectrometry

Unknown

Density

RBS, Rutherford Backscattering Spectrometry

Unknown

Chemical Composition, Impurities

NRA, Nuclear Reaction Analysis

Unknown

Extinction Coefficient

FTIR Spectroscopic Ellipsometry

Sentech Sendira

Thickness

Ellipsometry

SENTECH SE 850

Refractive Index

Ellipsometry

SENTECH SE 850

Substrates

Silicon

Glass

Calcium

Keywords

Notes

1066



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