Publication Information

Title: Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier

Type: Journal

Info: Journal of Vacuum Science & Technology A 36, 01A112 (2018)

Date: 2017-11-09

DOI: http://dx.doi.org/10.1116/1.5006781

Author Information

Name

Institution

University of Wuppertal

University of Wuppertal

University of Wuppertal

University of Wuppertal

University of Wuppertal

University of Wuppertal

Ruhr-University Bochum

Sentech Instruments GmbH

University of Wuppertal

Sentech Instruments GmbH

University of Wuppertal

Films

Plasma SnO2 using Custom Spatial

Deposition Temperature Range = 80-165C

1066-77-9

7782-44-7

Thermal SnO2 using Custom Spatial

Deposition Temperature Range = 80-165C

1066-77-9

7732-18-5

Thermal SnO2 using Custom Spatial

Deposition Temperature Range = 80-165C

1066-77-9

10028-15-6

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Carrier Concentration

van der Pauw sheet resistance

-

Resistivity, Sheet Resistance

van der Pauw sheet resistance

-

Mobility

Hall Measurements

-

Water Vapor Transmission Rate (WVTR)

Calcium Test

-

Chemical Composition, Impurities

RBS, Rutherford Backscattering Spectrometry

-

Density

RBS, Rutherford Backscattering Spectrometry

-

Chemical Composition, Impurities

NRA, Nuclear Reaction Analysis

-

Extinction Coefficient

FTIR Spectroscopic Ellipsometry

SENTECH Sendira

Thickness

Ellipsometry

SENTECH SE850

Refractive Index

Ellipsometry

SENTECH SE850

Substrates

Silicon

Glass

Calcium

Keywords

Notes

1066



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