Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 36, 01A112 (2018)
Date:
2017-11-09
Author Information
| Name | Institution |
|---|---|
| Lukas Hoffmann | University of Wuppertal |
| Detlef Theirich | University of Wuppertal |
| Daniel Schlamm | University of Wuppertal |
| Tim Hasselmann | University of Wuppertal |
| Sven Pack | University of Wuppertal |
| Kai Oliver Brinkmann | University of Wuppertal |
| Detlef Rogalla | Ruhr-University Bochum |
| Sven Peters | Sentech Instruments GmbH |
| André Räupke | University of Wuppertal |
| Hassan Gargouri | Sentech Instruments GmbH |
| Thomas Riedl | University of Wuppertal |
Films
Plasma SnO2
Thermal SnO2
Thermal SnO2
Film/Plasma Properties
Characteristic: Carrier Concentration
Analysis: van der Pauw sheet resistance
Characteristic: Resistivity, Sheet Resistance
Analysis: van der Pauw sheet resistance
Characteristic: Mobility
Analysis: Hall Measurements
Characteristic: Water Vapor Transmission Rate (WVTR)
Analysis: Calcium Test
Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry
Characteristic: Density
Analysis: RBS, Rutherford Backscattering Spectrometry
Characteristic: Chemical Composition, Impurities
Analysis: NRA, Nuclear Reaction Analysis
Characteristic: Extinction Coefficient
Analysis: FTIR Spectroscopic Ellipsometry
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Substrates
| Silicon |
| Glass |
| Calcium |
Notes
| 1066 |