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Hassan Gargouri Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Hassan Gargouri returned 18 record(s).

NumberTitle
1In-gap states in titanium dioxide and oxynitride atomic layer deposited films
2Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
3Three dimensional ALD of TiO2 for in-vivo biomedical sensor applications
4Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
5Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
6Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
7Analysis of nitrogen species in titanium oxynitride ALD films
8Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
9Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
10Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
11Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
12Analysis of titanium species in titanium oxynitride films prepared by plasma enhanced atomic layer deposition
13Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
14Atomic Layer Deposition of Al2O3 Thin Films for Metal Insulator Semiconductor Applications on 4H-SiC
15Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
16In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
17Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study
18Structural and electrical properties of AlN thin films on GaN substrates grown by plasma enhanced-Atomic Layer Deposition