In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition

Type:
Journal
Info:
J. Vac. Sci. Technol. B 38(1) Jan/Feb 2020
Date:
2019-12-17

Author Information

Name Institution
Franziska NaumannSentech Instruments GmbH
Johanna ReckSentech Instruments GmbH
Hassan GargouriSentech Instruments GmbH
Bernd GruskaSentech Instruments GmbH
Adrian BlümichAEMtec GmbH
Ali MahmoodinezhadBrandenburg University of Technology
Christoph JanowitzBrandenburg University of Technology
Karsten HenkelBrandenburg University of Technology
Jan Ingo FlegeBrandenburg University of Technology

Films

Plasma Al2O3


Thermal Al2O3


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Optical Properties
Analysis: Ellipsometry

Characteristic: Optical Absorption
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Chemical Composition, Impurities
Analysis: Ellipsometry

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Substrates

Al2O3

Keywords

Plasma vs Thermal Comparison

Notes

1569