In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition

Type:
Journal
Info:
J. Vac. Sci. Technol. B 38(1) Jan/Feb 2020
Date:
2019-12-17

Author Information

Name Institution
Franziska NaumannSentech Instruments GmbH
Johanna ReckSentech Instruments GmbH
Hassan GargouriSentech Instruments GmbH
Bernd GruskaSentech Instruments GmbH
Adrian Bl├╝michAEMtec GmbH
Ali MahmoodinezhadBrandenburg University of Technology
Christoph JanowitzBrandenburg University of Technology
Karsten HenkelBrandenburg University of Technology
Jan Ingo FlegeBrandenburg University of Technology

Films

Plasma Al2O3


Thermal Al2O3


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Optical Properties
Analysis: Ellipsometry

Characteristic: Optical Absorption
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Chemical Composition, Impurities
Analysis: Ellipsometry

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Substrates

Al2O3

Keywords

Plasma vs Thermal Comparison

Notes

1569