SENTECH Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using SENTECH hardware returned 30 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
2Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
3Crystalline growth of AlN thin films by atomic layer deposition
4Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
5Atomic Layer Deposition of Al2O3 Thin Films for Metal Insulator Semiconductor Applications on 4H-SiC
6Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
7Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
8Organic narrowband near-infrared photodetectors based on intermolecular charge-transfer absorption
9Analysis of nitrogen species in titanium oxynitride ALD films
10Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
11Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
12Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
13Advances in the fabrication of graphene transistors on flexible substrates
14Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
15Structural and electrical properties of AlN thin films on GaN substrates grown by plasma enhanced-Atomic Layer Deposition
16Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
17Three dimensional ALD of TiO2 for in-vivo biomedical sensor applications
18Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
19Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
20Analysis of titanium species in titanium oxynitride films prepared by plasma enhanced atomic layer deposition
21Optical display film as flexible and light trapping substrate for organic photovoltaics
22Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
23Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
24Comparative study of ALD SiO2 thin films for optical applications
25Flexible, light trapping substrates for organic photovoltaics
26Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
27Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study
28In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
29In-gap states in titanium dioxide and oxynitride atomic layer deposited films
30Breakdown and Protection of ALD Moisture Barrier Thin Films