SENTECH Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using SENTECH hardware returned 30 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Analysis of titanium species in titanium oxynitride films prepared by plasma enhanced atomic layer deposition
2Breakdown and Protection of ALD Moisture Barrier Thin Films
3Crystalline growth of AlN thin films by atomic layer deposition
4Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
5Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
6Three dimensional ALD of TiO2 for in-vivo biomedical sensor applications
7Advances in the fabrication of graphene transistors on flexible substrates
8Optical display film as flexible and light trapping substrate for organic photovoltaics
9Analysis of nitrogen species in titanium oxynitride ALD films
10Comparative study of ALD SiO2 thin films for optical applications
11Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
12In-gap states in titanium dioxide and oxynitride atomic layer deposited films
13Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
14Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
15Organic narrowband near-infrared photodetectors based on intermolecular charge-transfer absorption
16Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
17Structural and electrical properties of AlN thin films on GaN substrates grown by plasma enhanced-Atomic Layer Deposition
18Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
19Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
20Flexible, light trapping substrates for organic photovoltaics
21Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
22Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study
23Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
24Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
25In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
26Atomic Layer Deposition of Al2O3 Thin Films for Metal Insulator Semiconductor Applications on 4H-SiC
27Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
28Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
29Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
30Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition