SENTECH Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using SENTECH hardware returned 30 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Advances in the fabrication of graphene transistors on flexible substrates
2Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
3Analysis of nitrogen species in titanium oxynitride ALD films
4Analysis of titanium species in titanium oxynitride films prepared by plasma enhanced atomic layer deposition
5Atomic Layer Deposition of Al2O3 Thin Films for Metal Insulator Semiconductor Applications on 4H-SiC
6Breakdown and Protection of ALD Moisture Barrier Thin Films
7Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
8Comparative study of ALD SiO2 thin films for optical applications
9Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
10Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
11Crystalline growth of AlN thin films by atomic layer deposition
12Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
13Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
14Flexible, light trapping substrates for organic photovoltaics
15In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
16In-gap states in titanium dioxide and oxynitride atomic layer deposited films
17Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
18Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
19Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study
20Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
21Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
22Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
23Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
24Optical display film as flexible and light trapping substrate for organic photovoltaics
25Organic narrowband near-infrared photodetectors based on intermolecular charge-transfer absorption
26Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
27Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
28Structural and electrical properties of AlN thin films on GaN substrates grown by plasma enhanced-Atomic Layer Deposition
29Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
30Three dimensional ALD of TiO2 for in-vivo biomedical sensor applications