Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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SENTECH Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using SENTECH hardware returned 30 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Structural and electrical properties of AlN thin films on GaN substrates grown by plasma enhanced-Atomic Layer Deposition
2Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study
3Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
4Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
5Three dimensional ALD of TiO2 for in-vivo biomedical sensor applications
6Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
7Atomic Layer Deposition of Al2O3 Thin Films for Metal Insulator Semiconductor Applications on 4H-SiC
8Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
9Analysis of titanium species in titanium oxynitride films prepared by plasma enhanced atomic layer deposition
10Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
11Breakdown and Protection of ALD Moisture Barrier Thin Films
12Optical display film as flexible and light trapping substrate for organic photovoltaics
13Analysis of nitrogen species in titanium oxynitride ALD films
14Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
15Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
16Crystalline growth of AlN thin films by atomic layer deposition
17Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
18Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
19In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
20Flexible, light trapping substrates for organic photovoltaics
21Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
22Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
23Advances in the fabrication of graphene transistors on flexible substrates
24Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
25In-gap states in titanium dioxide and oxynitride atomic layer deposited films
26Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
27Organic narrowband near-infrared photodetectors based on intermolecular charge-transfer absorption
28Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
29Comparative study of ALD SiO2 thin films for optical applications
30Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor