SENTECH Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using SENTECH hardware returned 30 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
2In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
3Organic narrowband near-infrared photodetectors based on intermolecular charge-transfer absorption
4Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
5Atomic Layer Deposition of Al2O3 Thin Films for Metal Insulator Semiconductor Applications on 4H-SiC
6Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
7Analysis of nitrogen species in titanium oxynitride ALD films
8Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
9In-gap states in titanium dioxide and oxynitride atomic layer deposited films
10Optical display film as flexible and light trapping substrate for organic photovoltaics
11Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
12Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study
13Advances in the fabrication of graphene transistors on flexible substrates
14Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
15Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
16Breakdown and Protection of ALD Moisture Barrier Thin Films
17Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
18Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
19Analysis of titanium species in titanium oxynitride films prepared by plasma enhanced atomic layer deposition
20Structural and electrical properties of AlN thin films on GaN substrates grown by plasma enhanced-Atomic Layer Deposition
21Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
22Comparative study of ALD SiO2 thin films for optical applications
23Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
24Crystalline growth of AlN thin films by atomic layer deposition
25Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
26Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
27Flexible, light trapping substrates for organic photovoltaics
28Three dimensional ALD of TiO2 for in-vivo biomedical sensor applications
29Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
30Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study