SENTECH Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using SENTECH hardware returned 30 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
2Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
3In-gap states in titanium dioxide and oxynitride atomic layer deposited films
4In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
5Optical display film as flexible and light trapping substrate for organic photovoltaics
6Atomic Layer Deposition of Al2O3 Thin Films for Metal Insulator Semiconductor Applications on 4H-SiC
7Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
8Three dimensional ALD of TiO2 for in-vivo biomedical sensor applications
9Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
10Organic narrowband near-infrared photodetectors based on intermolecular charge-transfer absorption
11Comparative study of ALD SiO2 thin films for optical applications
12Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
13Flexible, light trapping substrates for organic photovoltaics
14Advances in the fabrication of graphene transistors on flexible substrates
15Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
16Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
17Analysis of nitrogen species in titanium oxynitride ALD films
18Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
19Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
20Analysis of titanium species in titanium oxynitride films prepared by plasma enhanced atomic layer deposition
21Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
22Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
23Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
24Crystalline growth of AlN thin films by atomic layer deposition
25Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
26Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
27Structural and electrical properties of AlN thin films on GaN substrates grown by plasma enhanced-Atomic Layer Deposition
28Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study
29Breakdown and Protection of ALD Moisture Barrier Thin Films
30Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties