SENTECH Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using SENTECH hardware returned 30 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
2Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
3In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
4Optical display film as flexible and light trapping substrate for organic photovoltaics
5Structural and electrical properties of AlN thin films on GaN substrates grown by plasma enhanced-Atomic Layer Deposition
6Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
7Atomic Layer Deposition of Al2O3 Thin Films for Metal Insulator Semiconductor Applications on 4H-SiC
8Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
9Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
10Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
11Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
12Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
13Breakdown and Protection of ALD Moisture Barrier Thin Films
14Flexible, light trapping substrates for organic photovoltaics
15Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
16Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
17Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
18Crystalline growth of AlN thin films by atomic layer deposition
19Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
20Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
21Organic narrowband near-infrared photodetectors based on intermolecular charge-transfer absorption
22Three dimensional ALD of TiO2 for in-vivo biomedical sensor applications
23Advances in the fabrication of graphene transistors on flexible substrates
24Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
25Analysis of titanium species in titanium oxynitride films prepared by plasma enhanced atomic layer deposition
26In-gap states in titanium dioxide and oxynitride atomic layer deposited films
27Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study
28Comparative study of ALD SiO2 thin films for optical applications
29Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
30Analysis of nitrogen species in titanium oxynitride ALD films