Publication Information

Title: Ag films grown by remote plasma enhanced atomic layer deposition on different substrates

Type: Journal

Info: Journal of Vacuum Science & Technology A 34, 01A126 (2016)

Date: 2015-11-10

DOI: http://dx.doi.org/10.1116/1.4936221

Author Information

Name

Institution

Otto-von-Guericke University

Otto-von-Guericke University

Sentech Instruments GmbH

Sentech Instruments GmbH

Sentech Instruments GmbH

IHP

Otto-von-Guericke University

Films

Plasma Ag using SENTECH

Deposition Temperature Range = 70-200C

165461-74-5

1333-74-0

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Physical Electronics PHI 5600 ESCA

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

Veeco Dimension 3100

Adhesion

AFM, Atomic Force Microscopy

Veeco Dimension 3100

Images

SEM, Scanning Electron Microscopy

-

Morphology, Roughness, Topography

SEM, Scanning Electron Microscopy

-

Thickness

SEM, Scanning Electron Microscopy

-

Adhesion

SEM, Scanning Electron Microscopy

-

Images

TEM, Transmission Electron Microscope

-

Adhesion

TEM, Transmission Electron Microscope

-

Morphology, Roughness, Topography

TEM, Transmission Electron Microscope

-

Chemical Composition, Impurities

EDS, EDX, Energy Dispersive X-ray Spectroscopy

-

Resistivity, Sheet Resistance

Four-point Probe

CDE ResMap 168

Dielectric Constant, Permittivity

Ellipsometry

SENTECH SE850

Refractive Index

Ellipsometry

SENTECH SE850

Thickness

XRF, X-Ray Fluorescence

Fischerscope X-ray XDV-SDD

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

Bruker/AXS D5000

Substrates

SiO2

TiN

Ti

Co

Ni

W

Keywords

Notes

410



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