Publication Information

Title:
Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 34, 01A126 (2016)
Date:
2015-11-10

Author Information

Name Institution
Akinwumi A. AmusanOtto-von-Guericke University
Bodo KalkofenOtto-von-Guericke University
Hassan GargouriSentech Instruments GmbH
Klaus WandelSentech Instruments GmbH
Cay PinnowSentech Instruments GmbH
Marco LiskerIHP
Edmund P. BurteOtto-von-Guericke University

Films


Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Adhesion
Analysis: AFM, Atomic Force Microscopy

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Thickness
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Adhesion
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Images
Analysis: TEM, Transmission Electron Microscope

Characteristic: Adhesion
Analysis: TEM, Transmission Electron Microscope

Characteristic: Morphology, Roughness, Topography
Analysis: TEM, Transmission Electron Microscope

Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe

Characteristic: Dielectric Constant, Permittivity
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Thickness
Analysis: XRF, X-Ray Fluorescence

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Substrates

SiO2
TiN
Ti
Co
Ni
W

Keywords

Notes

410