Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
Type:
Journal
Info:
Beilstein J. Nanotechnol. 2013, 4, 732--742
Date:
2013-10-23
Author Information
Name | Institution |
---|---|
Jorg Haeberle | Brandenburg University of Technology |
Karsten Henkel | Brandenburg University of Technology |
Hassan Gargouri | Sentech Instruments GmbH |
Franziska Naumann | Sentech Instruments GmbH |
Bernd Gruska | Sentech Instruments GmbH |
Michael Arens | Sentech Instruments GmbH |
Massimo Tallarida | Brandenburg University of Technology |
Dieter Schmeißer | Brandenburg University of Technology |
Films
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Substrates
Si with native oxide |
Notes
566 |