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Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
Experimental and numerical analysis of the effects of ion bombardment in silicon oxide (SiO2) plasma enhanced atomic layer deposition (PEALD) processes
Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
Type:
Journal
Info:
Beilstein J. Nanotechnol. 2013, 4, 732--742
Date:
2013-10-23
Author Information
| Name | Institution |
|---|---|
| Jorg Haeberle | Brandenburg University of Technology |
| Karsten Henkel | Brandenburg University of Technology |
| Hassan Gargouri | Sentech Instruments GmbH |
| Franziska Naumann | Sentech Instruments GmbH |
| Bernd Gruska | Sentech Instruments GmbH |
| Michael Arens | Sentech Instruments GmbH |
| Massimo Tallarida | Brandenburg University of Technology |
| Dieter Schmeißer | Brandenburg University of Technology |
Films
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Substrates
| Si with native oxide |
Keywords
Notes
| 566 |