Title: Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
Type: Journal
Info: Beilstein J. Nanotechnol. 2013, 4, 732--742
Date: 2013-10-23
DOI: http://dx.doi.org/10.3762/bjnano.4.83
Name
Institution
Brandenburg University of Technology
Brandenburg University of Technology
Sentech Instruments GmbH
Sentech Instruments GmbH
Sentech Instruments GmbH
Sentech Instruments GmbH
Brandenburg University of Technology
Brandenburg University of Technology
Characteristic
Analysis
Diagnostic
Thickness
Ellipsometry
SENTECH SE800
Refractive Index
Ellipsometry
SENTECH SE800
Chemical Composition, Impurities
XPS, X-ray Photoelectron Spectroscopy
Specs
Chemical Composition, Impurities
EDS, EDX, Energy Dispersive X-ray Spectroscopy
Unknown
Si with native oxide
566
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