Search Plasma ALD Publication Database By...

Publication Information

Title: Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films

Type: Journal

Info: Beilstein J. Nanotechnol. 2013, 4, 732--742

Date: 2013-10-23

DOI: http://dx.doi.org/10.3762/bjnano.4.83

Author Information

Name

Institution

Brandenburg University of Technology

Brandenburg University of Technology

Sentech Instruments GmbH

Sentech Instruments GmbH

Sentech Instruments GmbH

Sentech Instruments GmbH

Brandenburg University of Technology

Brandenburg University of Technology

Films

Thermal Al2O3 using SENTECH

Deposition Temperature = 200C

75-24-1

7732-18-5

Plasma Al2O3 using SENTECH

Deposition Temperature Range = 25-200C

75-24-1

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

SENTECH SE 800

Refractive Index

Ellipsometry

SENTECH SE 800

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Specs

Chemical Composition, Impurities

EDS, EDX, Energy Dispersive X-ray Spectroscopy

Unknown

Substrates

Si with native oxide

Keywords

Notes

566


Follow @PlasmaALDGuy
Mark Sowa

Shortcuts



© 2014-2018 plasma-ald.com