Publication Information

Title:
Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
Type:
Journal
Info:
Beilstein J. Nanotechnol. 2013, 4, 732--742
Date:
2013-10-23

Author Information

Name Institution
Jorg HaeberleBrandenburg University of Technology
Karsten HenkelBrandenburg University of Technology
Hassan GargouriSentech Instruments GmbH
Franziska NaumannSentech Instruments GmbH
Bernd GruskaSentech Instruments GmbH
Michael ArensSentech Instruments GmbH
Massimo TallaridaBrandenburg University of Technology
Dieter Schmei├čerBrandenburg University of Technology

Films

Thermal Al2O3


Plasma Al2O3


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy

Substrates

Si with native oxide

Keywords

Notes

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