Publication Information

Title: Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films

Type: Journal

Info: Beilstein J. Nanotechnol. 2013, 4, 732--742

Date: 2013-10-23

DOI: http://dx.doi.org/10.3762/bjnano.4.83

Author Information

Name

Institution

Jorg Haeberle

Brandenburg University of Technology

Karsten Henkel

Brandenburg University of Technology

Hassan Gargouri

Sentech Instruments GmbH

Franziska Naumann

Sentech Instruments GmbH

Bernd Gruska

Sentech Instruments GmbH

Michael Arens

Sentech Instruments GmbH

Massimo Tallarida

Brandenburg University of Technology

Dieter Schmeißer

Brandenburg University of Technology

Films

Thermal Al2O3 using SENTECH

Deposition Temperature = 200C

TMA, Trimethyl Aluminum, Trimethylalane, Trimethylaluminium, Aluminium Trimethyl, Aluminum Trimethanide, Al(CH3)3, AlMe3, Al2(CH3)6, Al2Me6

75-24-1

Where to buy precursor

Water, H2O

7732-18-5

Plasma Al2O3 using SENTECH

Deposition Temperature Range = 25-200C

TMA, Trimethyl Aluminum, Trimethylalane, Trimethylaluminium, Aluminium Trimethyl, Aluminum Trimethanide, Al(CH3)3, AlMe3, Al2(CH3)6, Al2Me6

75-24-1

Where to buy precursor

Oxygen, O2

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

SENTECH SE 800

Refractive Index

Ellipsometry

SENTECH SE 800

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Specs

Chemical Composition, Impurities

EDS, EDX, Energy Dispersive X-ray Spectroscopy

Unknown

Substrates

Si with native oxide

Keywords

Notes

566


Mark Sowa

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