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196 Films Compositions
265 Precursors and Plasma Gases
76 Deposition Hardwares
242 Film and Plasma Characteristics
84 Theses
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Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
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Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
Type:
Journal
Info:
Beilstein J. Nanotechnol. 2013, 4, 732--742
Date:
2013-10-23
Author Information
| Name | Institution |
|---|---|
| Jorg Haeberle | Brandenburg University of Technology |
| Karsten Henkel | Brandenburg University of Technology |
| Hassan Gargouri | Sentech Instruments GmbH |
| Franziska Naumann | Sentech Instruments GmbH |
| Bernd Gruska | Sentech Instruments GmbH |
| Michael Arens | Sentech Instruments GmbH |
| Massimo Tallarida | Brandenburg University of Technology |
| Dieter Schmeißer | Brandenburg University of Technology |
Films
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Substrates
| Si with native oxide |
Keywords
Notes
| 566 |