Karsten Henkel Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Karsten Henkel returned 11 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
2Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
3Analysis of nitrogen species in titanium oxynitride ALD films
4In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
5Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
6Analysis of titanium species in titanium oxynitride films prepared by plasma enhanced atomic layer deposition
7Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
8In-gap states in titanium dioxide and oxynitride atomic layer deposited films
9Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
10Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study
11Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition