Publication Information

Title: Analysis of nitrogen species in titanium oxynitride ALD films

Type: Journal

Info: Applied Surface Science 381 (2016) 42 - 47

Date: 2016-02-08

DOI: http://dx.doi.org/10.1016/j.apsusc.2016.02.096

Author Information

Name

Institution

Brandenburg University of Technology

Brandenburg University of Technology

Brandenburg University of Technology

Sentech Instruments GmbH

Sentech Instruments GmbH

Sentech Instruments GmbH

Sentech Instruments GmbH

Brandenburg University of Technology

Brandenburg University of Technology

Films

Plasma TiON using SENTECH

Deposition Temperature Range = 200-300C

546-68-9

7664-41-7

Plasma TiON using SENTECH

Deposition Temperature Range = 250-350C

3275-24-9

7727-37-9

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Specs

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Synchrotron

Chemical Composition, Impurities

X-ray Absorption Spectroscopy

Synchrotron

Thickness

Ellipsometry

Unknown

Substrates

Si(001)

Keywords

Notes

770



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