Analysis of nitrogen species in titanium oxynitride ALD films

Type:
Journal
Info:
Applied Surface Science 381 (2016) 42 - 47
Date:
2016-02-08
DOI:
http://dx.doi.org/10.1016/j.apsusc.2016.02.096

Author Information

Name Institution
Małgorzata SowińskaBrandenburg University of Technology
Simone BrizziBrandenburg University of Technology
Chittaranjan DasBrandenburg University of Technology
Irina KärkkänenSentech Instruments GmbH
Jessica SchneidewindSentech Instruments GmbH
Franziska NaumannSentech Instruments GmbH
Hassan GargouriSentech Instruments GmbH
Karsten HenkelBrandenburg University of Technology
Dieter SchmeißerBrandenburg University of Technology

Films

Plasma TiON

Hardware used: SENTECH
TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)4
CAS#: 546-68-9
Where to buy precursor
NH3, Ammonia
CAS#: 7664-41-7
Where to buy precursor
Deposition Temperature Range = 200-300C

Plasma TiON

Hardware used: SENTECH
TDMATi, tetrakis(dimethylamido)titanium, titanium dimethylamide, (Me2N)4Ti
CAS#: 3275-24-9
Where to buy precursor
N2, Nitrogen
CAS#: 7727-37-9
Deposition Temperature Range = 250-350C

Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: Specs

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: Synchrotron

Characteristic: Chemical Composition, Impurities
Analysis: X-ray Absorption Spectroscopy
Diagnostic: Synchrotron

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: -

Substrates

Si(001)

Notes

770