Analysis of nitrogen species in titanium oxynitride ALD films

Type:
Journal
Info:
Applied Surface Science 381 (2016) 42 - 47
Date:
2016-02-08

Author Information

Name Institution
Małgorzata SowińskaBrandenburg University of Technology
Simone BrizziBrandenburg University of Technology
Chittaranjan DasBrandenburg University of Technology
Irina KärkkänenSentech Instruments GmbH
Jessica SchneidewindSentech Instruments GmbH
Franziska NaumannSentech Instruments GmbH
Hassan GargouriSentech Instruments GmbH
Karsten HenkelBrandenburg University of Technology
Dieter SchmeißerBrandenburg University of Technology

Films

Plasma TiON


Plasma TiON


Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Chemical Composition, Impurities
Analysis: X-ray Absorption Spectroscopy

Characteristic: Thickness
Analysis: Ellipsometry

Substrates

Si(001)

Keywords

Notes

770