Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Irina Kärkkänen Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Irina Kärkkänen returned 4 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Analysis of titanium species in titanium oxynitride films prepared by plasma enhanced atomic layer deposition
2In-gap states in titanium dioxide and oxynitride atomic layer deposited films
3Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
4Analysis of nitrogen species in titanium oxynitride ALD films