Publication Information

Title: Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study

Type: Journal

Info: Journal of Vacuum Science & Technology A 34(1) 2016

Date: 2015-11-10

DOI: http://dx.doi.org/10.1116/1.4936227

Author Information

Name

Institution

Brandenburg University of Technology

Brandenburg University of Technology

Brandenburg University of Technology

Sentech Instruments GmbH

Sentech Instruments GmbH

Sentech Instruments GmbH

Sentech Instruments GmbH

Sentech Instruments GmbH

Films

Plasma TiON using SENTECH

Deposition Temperature Range = 170-300C

546-68-9

7664-41-7

Plasma TiON using SENTECH

Deposition Temperature Range = 250-450C

3275-24-9

7727-37-9

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

SENTECH SE 800

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Custom

Capacitance

C-V, Capacitance-Voltage Measurements

Agilent 4284A LCR Meter

Dielectric Constant, Permittivity

C-V, Capacitance-Voltage Measurements

Agilent 4284A LCR Meter

Leakage Current

I-V, Current-Voltage Measurements

Custom

Substrates

Si(001)

Keywords

Notes

Oxygen in the TDMAT/N2 process comes from residual water and oxygen in the chamber.

415



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