Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study

Type:
Journal
Info:
Journal of Vacuum Science & Technology A 34(1) 2016
Date:
2015-11-10

Author Information

Name Institution
Małgorzata SowińskaBrandenburg University of Technology
Karsten HenkelBrandenburg University of Technology
Dieter SchmeißerBrandenburg University of Technology
Irina KärkkänenSentech Instruments GmbH
Jessica SchneidewindSentech Instruments GmbH
Franziska NaumannSentech Instruments GmbH
Bernd GruskaSentech Instruments GmbH
Hassan GargouriSentech Instruments GmbH

Films

Plasma TiON


Plasma TiON


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Capacitance
Analysis: C-V, Capacitance-Voltage Measurements

Characteristic: Dielectric Constant, Permittivity
Analysis: C-V, Capacitance-Voltage Measurements

Characteristic: Leakage Current
Analysis: I-V, Current-Voltage Measurements

Substrates

Si(001)

Keywords

Notes

Oxygen in the TDMAT/N2 process comes from residual water and oxygen in the chamber.
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