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An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Dieter Schmeißer Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Dieter Schmeißer returned 11 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
2Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
3Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study
4In-gap states in titanium dioxide and oxynitride atomic layer deposited films
5Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
6Analysis of titanium species in titanium oxynitride films prepared by plasma enhanced atomic layer deposition
7Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
8Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
9Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
10Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
11Analysis of nitrogen species in titanium oxynitride ALD films