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Optical in situ monitoring of plasma-enhanced atomic layer deposition process
The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
The Applications of Ultra-Thin Nanofilm for Aerospace Advanced Manufacturing Technology
Texture of atomic layer deposited ruthenium
Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET
Analysis of titanium species in titanium oxynitride films prepared by plasma enhanced atomic layer deposition
Type:
Journal
Info:
Surface & Coatings Technology (2016)
Date:
2016-11-25
Author Information
| Name | Institution |
|---|---|
| Małgorzata Kot | Brandenburg University of Technology |
| Karsten Henkel | Brandenburg University of Technology |
| Chittaranjan Das | Brandenburg University of Technology |
| Simone Brizzi | Brandenburg University of Technology |
| Irina Kärkkänen | Sentech Instruments GmbH |
| Jessica Schneidewind | Sentech Instruments GmbH |
| Franziska Naumann | Sentech Instruments GmbH |
| Hassan Gargouri | Sentech Instruments GmbH |
| Dieter Schmeißer | Brandenburg University of Technology |
Films
Film/Plasma Properties
Substrates
Keywords
Notes
| 917 |