Analysis of titanium species in titanium oxynitride films prepared by plasma enhanced atomic layer deposition

Publication Information

Title: Analysis of titanium species in titanium oxynitride films prepared by plasma enhanced atomic layer deposition

Type: Journal

Info: Surface & Coatings Technology (2016)

Date: 2016-11-25

DOI: http://dx.doi.org/10.1016/j.surfcoat.2016.11.094

Author Information

Name

Institution

Małgorzata Kot

Brandenburg University of Technology

Karsten Henkel

Brandenburg University of Technology

Chittaranjan Das

Brandenburg University of Technology

Simone Brizzi

Brandenburg University of Technology

Irina Kärkkänen

Sentech Instruments GmbH

Jessica Schneidewind

Sentech Instruments GmbH

Franziska Naumann

Sentech Instruments GmbH

Hassan Gargouri

Sentech Instruments GmbH

Dieter Schmeißer

Brandenburg University of Technology

Films

Plasma TiON using SENTECH

Deposition Temperature Range N/A

TDMATi, (Me₂N)₄Ti, [(CH₃)₂N]₄Ti, Tetrakis (DiMethylAmido) Titanium, Titanium Dimethylamide

3275-24-9

Where to buy precursor

N₂, Nitrogen

7727-37-9

Plasma TiON using SENTECH

Deposition Temperature Range N/A

TTIP, Titanium(IV) i-propoxide

546-68-9

Where to buy precursor

NH₃, Ammonia

7664-41-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Substrates

Keywords

Notes

917

Mark Sowa

Shortcuts

Films

Precursors

Deposition Hardware

Film and Plasma Characteristics

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