Publication Information

Title: Analysis of titanium species in titanium oxynitride films prepared by plasma enhanced atomic layer deposition

Type: Journal

Info: Surface & Coatings Technology (2016)

Date: 2016-11-25

DOI: http://dx.doi.org/10.1016/j.surfcoat.2016.11.094

Author Information

Name

Institution

Brandenburg University of Technology

Brandenburg University of Technology

Brandenburg University of Technology

Brandenburg University of Technology

Sentech Instruments GmbH

Sentech Instruments GmbH

Sentech Instruments GmbH

Sentech Instruments GmbH

Brandenburg University of Technology

Films

Plasma TiON using SENTECH

Deposition Temperature Range N/A

3275-24-9

7727-37-9

Plasma TiON using SENTECH

Deposition Temperature Range N/A

546-68-9

7664-41-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Substrates

Keywords

Notes

917



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