Analysis of titanium species in titanium oxynitride films prepared by plasma enhanced atomic layer deposition

Type:
Journal
Info:
Surface & Coatings Technology (2016)
Date:
2016-11-25
DOI:
http://dx.doi.org/10.1016/j.surfcoat.2016.11.094

Author Information

Name Institution
Małgorzata KotBrandenburg University of Technology
Karsten HenkelBrandenburg University of Technology
Chittaranjan DasBrandenburg University of Technology
Simone BrizziBrandenburg University of Technology
Irina KärkkänenSentech Instruments GmbH
Jessica SchneidewindSentech Instruments GmbH
Franziska NaumannSentech Instruments GmbH
Hassan GargouriSentech Instruments GmbH
Dieter SchmeißerBrandenburg University of Technology

Films

Plasma TiON

Hardware used: SENTECH
TDMATi, tetrakis(dimethylamido)titanium, titanium dimethylamide, (Me2N)4Ti
CAS#: 3275-24-9
Where to buy precursor
N2, Nitrogen
CAS#: 7727-37-9
Deposition Temperature Range N/A

Plasma TiON

Hardware used: SENTECH
TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)4
CAS#: 546-68-9
Where to buy precursor
NH3, Ammonia
CAS#: 7664-41-7
Where to buy precursor
Deposition Temperature Range N/A

Film/Plasma Properties

Substrates

Notes

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