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An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Małgorzata Kot Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Małgorzata Kot returned 5 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Analysis of titanium species in titanium oxynitride films prepared by plasma enhanced atomic layer deposition
2Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
3Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
4In-gap states in titanium dioxide and oxynitride atomic layer deposited films
5Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study