The publication database currently has 1673 entries.
Use Advanced Search for more complex searches
Recent Database Additions
Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
Experimental and numerical analysis of the effects of ion bombardment in silicon oxide (SiO2) plasma enhanced atomic layer deposition (PEALD) processes
Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 36, 01A114 (2018)
Date:
2017-11-16
Author Information
| Name | Institution |
|---|---|
| Małgorzata Kot | Brandenburg University of Technology |
| Justyna Łobaza | Brandenburg University of Technology |
| Franziska Naumann | Sentech Instruments GmbH |
| Hassan Gargouri | Sentech Instruments GmbH |
| Karsten Henkel | Brandenburg University of Technology |
| Dieter Schmeißer | Brandenburg University of Technology |
Films
Film/Plasma Properties
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Compositional Depth Profiling
Analysis: ARXPS, Angle Resolved X-ray Photoelectron Spectroscopy
Substrates
| Si(001) |
Keywords
Notes
| 1097 |