2021 Year in Review
The publication database currently has 1616 entries.
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202 Films Compositions
272 Precursors and Plasma Gases
77 Deposition Hardwares
250 Film and Plasma Characteristics
88 Theses
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Tailoring angular selectivity in SiO2 slanted columnar thin films using atomic layer deposition of titanium nitride
Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
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Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 36, 01A114 (2018)
Date:
2017-11-16
Author Information
| Name | Institution |
|---|---|
| Małgorzata Kot | Brandenburg University of Technology |
| Justyna Łobaza | Brandenburg University of Technology |
| Franziska Naumann | Sentech Instruments GmbH |
| Hassan Gargouri | Sentech Instruments GmbH |
| Karsten Henkel | Brandenburg University of Technology |
| Dieter Schmeißer | Brandenburg University of Technology |
Films
Film/Plasma Properties
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Compositional Depth Profiling
Analysis: ARXPS, Angle Resolved X-ray Photoelectron Spectroscopy
Substrates
| Si(001) |
Keywords
Notes
| 1097 |