The publication database currently has 1600 entries.
Search from:
198 Films Compositions
265 Precursors and Plasma Gases
76 Deposition Hardwares
249 Film and Plasma Characteristics
85 Theses
Use Multifactor Search for more complex searches and for searching by other criteria (author, affiliation, analysis, deposition temperature)
ALD Links
Contact Us
Advertising
Recent Database Additions
Atomic layer epitaxy of germanium
Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
Top Searches for August 2021
Most Searched Films
Search 1600 plasma ALD publications by:
Search 1600 plasma ALD publications by:
Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 36, 01A114 (2018)
Date:
2017-11-16
Author Information
| Name | Institution |
|---|---|
| Małgorzata Kot | Brandenburg University of Technology |
| Justyna Łobaza | Brandenburg University of Technology |
| Franziska Naumann | Sentech Instruments GmbH |
| Hassan Gargouri | Sentech Instruments GmbH |
| Karsten Henkel | Brandenburg University of Technology |
| Dieter Schmeißer | Brandenburg University of Technology |
Films
Film/Plasma Properties
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Compositional Depth Profiling
Analysis: ARXPS, Angle Resolved X-ray Photoelectron Spectroscopy
Substrates
| Si(001) |
Keywords
Notes
| 1097 |