Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study

Publication Information

Title: Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study

Type: Journal

Info: Journal of Vacuum Science & Technology A 36, 01A114 (2018)

Date: 2017-11-16

DOI: http://dx.doi.org/10.1116/1.5003356

Author Information

Name

Institution

Małgorzata Kot

Brandenburg University of Technology

Justyna Łobaza

Brandenburg University of Technology

Franziska Naumann

Sentech Instruments GmbH

Hassan Gargouri

Sentech Instruments GmbH

Karsten Henkel

Brandenburg University of Technology

Dieter Schmeißer

Brandenburg University of Technology

Films

Plasma TiON using SENTECH

Deposition Temperature = 350C

TDMATi, (Me₂N)₄Ti, [(CH₃)₂N]₄Ti, Tetrakis (DiMethylAmido) Titanium, Titanium Dimethylamide

3275-24-9

Where to buy precursor

N₂, Nitrogen

7727-37-9

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Compositional Depth Profiling

ARXPS, Angle Resolved X-ray Photoelectron Spectroscopy

Substrates

Si(001)

Keywords

Notes

1097

Mark Sowa

Shortcuts

Films

Precursors

Deposition Hardware

Film and Plasma Characteristics

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