Publication Information

Title: Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study

Type: Journal

Info: Journal of Vacuum Science & Technology A 36, 01A114 (2018)

Date: 2017-11-16

DOI: http://dx.doi.org/10.1116/1.5003356

Author Information

Name

Institution

Brandenburg University of Technology

Brandenburg University of Technology

Sentech Instruments GmbH

Sentech Instruments GmbH

Brandenburg University of Technology

Brandenburg University of Technology

Films

Plasma TiON using SENTECH

Deposition Temperature = 350C

3275-24-9

7727-37-9

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Unknown

Compositional Depth Profiling

ARXPS, Angle Resolved X-ray Photoelectron Spectroscopy

Unknown

Substrates

Si(001)

Keywords

Notes

1097



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