Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study

Type:
Journal
Info:
Journal of Vacuum Science & Technology A 36, 01A114 (2018)
Date:
2017-11-16

Author Information

Name Institution
Małgorzata KotBrandenburg University of Technology
Justyna ŁobazaBrandenburg University of Technology
Franziska NaumannSentech Instruments GmbH
Hassan GargouriSentech Instruments GmbH
Karsten HenkelBrandenburg University of Technology
Dieter SchmeißerBrandenburg University of Technology

Films

Plasma TiON


Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Compositional Depth Profiling
Analysis: ARXPS, Angle Resolved X-ray Photoelectron Spectroscopy

Substrates

Si(001)

Notes

1097