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Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
Experimental and numerical analysis of the effects of ion bombardment in silicon oxide (SiO2) plasma enhanced atomic layer deposition (PEALD) processes
Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 38, 032410 (2020)
Date:
2020-04-01
Author Information
| Name | Institution |
|---|---|
| Raffaella Lo Nigro | CNR-IMM |
| Emanuela Schilirò | CNR-IMM |
| Patrick Fiorenza | CNR-IMM |
| Fabrizio Roccaforte | CNR-IMM |
Films
Film/Plasma Properties
Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Dielectric Constant, Permittivity
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Fixed Charge
Analysis: C-V, Capacitance-Voltage Measurements
Substrates
| SiO2 |
Keywords
Notes
| 1515 |