Search 1553 plasma ALD publications by:
Search 1553 plasma ALD publications by:
Publication Information
Title:
Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 38, 032410 (2020)
Date:
2020-04-01
Author Information
Name | Institution |
---|---|
Raffaella Lo Nigro | CNR-IMM |
Emanuela SchilirĂ² | CNR-IMM |
Patrick Fiorenza | CNR-IMM |
Fabrizio Roccaforte | CNR-IMM |
Films
Film/Plasma Properties
Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Dielectric Constant, Permittivity
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Fixed Charge
Analysis: C-V, Capacitance-Voltage Measurements
Substrates
SiO2 |
Keywords
Notes
1515 |
Popular Precursors
Top Authors
Erwin (W.M.M.) Kessels |
Hyeongtag Jeon |
Hyungjun Kim |
Mauritius C. M. (Richard) van de Sanden |
Christophe Detavernier |