2021 Year in Review
The publication database currently has 1616 entries.
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202 Films Compositions
272 Precursors and Plasma Gases
77 Deposition Hardwares
250 Film and Plasma Characteristics
88 Theses
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Tailoring angular selectivity in SiO2 slanted columnar thin films using atomic layer deposition of titanium nitride
Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
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Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 38, 032410 (2020)
Date:
2020-04-01
Author Information
| Name | Institution |
|---|---|
| Raffaella Lo Nigro | CNR-IMM |
| Emanuela Schilirò | CNR-IMM |
| Patrick Fiorenza | CNR-IMM |
| Fabrizio Roccaforte | CNR-IMM |
Films
Film/Plasma Properties
Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Dielectric Constant, Permittivity
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Fixed Charge
Analysis: C-V, Capacitance-Voltage Measurements
Substrates
| SiO2 |
Keywords
Notes
| 1515 |