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The publication database currently has 1636 entries.
203 Films Compositions
274 Precursors and Plasma Gases
77 Deposition Hardwares
251 Film and Plasma Characteristics
91 Theses
5041 Authors

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Recent Database Additions
Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene Electron-enhanced atomic layer deposition of silicon thin films at room temperature Atomic-layer selective deposition of silicon nitride on hydrogen-terminated Si surfaces
Search 1636 plasma ALD publications by:
203 Films Compositions
274 Precursors and Plasma Gases
77 Deposition Hardwares
251 Film and Plasma Characteristics

Patrick Fiorenza Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Patrick Fiorenza returned 7 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Atomic Layer Deposition of Al2O3 Thin Films for Metal Insulator Semiconductor Applications on 4H-SiC
2Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
3Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
4Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
5Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
6Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
7Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition

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