Publication Information

Title:
Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
Type:
Journal
Info:
physica status solidi (c) Volume 12, Issue 7, pages 980-984, July 2015
Date:
2015-06-05

Author Information

Name Institution
Emanuela SchiliròNational Research Council (CNR - Italy)
Giuseppe GrecoNational Research Council (CNR - Italy)
Patrick FiorenzaNational Research Council (CNR - Italy)
Cristina TudiscoUniversità di Catania
Guglielmo Guido CondorelliUniversità di Catania
Salvatore Di FrancoUniversità di Catania
Fabrizio RoccaforteNational Research Council (CNR - Italy)
Raffaella Lo NigroNational Research Council (CNR - Italy)

Films

Plasma Al2O3


Film/Plasma Properties

Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope

Characteristic: Microstructure
Analysis: Electron Diffraction

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Bonding States
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Dielectric Constant, Permittivity
Analysis: -

Substrates

Si(100)
AlGaN

Keywords

Notes

464