Publication Information

Title:
Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
Type:
Journal
Info:
Thin Solid Films (2015)
Date:
2015-11-16

Author Information

Name Institution
Raffaella Lo NigroNational Research Council (CNR - Italy)
Emanuela SchilirĂ²National Research Council (CNR - Italy)
Giuseppe GrecoNational Research Council (CNR - Italy)
Patrick FiorenzaNational Research Council (CNR - Italy)
Fabrizio RoccaforteNational Research Council (CNR - Italy)

Films

Plasma Al2O3



Film/Plasma Properties

Substrates

Silicon

Keywords

Notes

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