Crystalline growth of AlN thin films by atomic layer deposition
Type:
Conference Proceedings
Info:
Journal of Physics: Conference Series 757 (2016) 012003
Date:
2016-09-06
Author Information
| Name | Institution |
|---|---|
| S Sadeghpour | KU Leuven |
| F Ceyssens | KU Leuven |
| R Puers | KU Leuven |
Films
Film/Plasma Properties
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Thickness
Analysis: Reflectometry
Characteristic: Thickness
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Substrates
| Si(100) |
| Glass |
| Ti |
Notes
| 850 |