Publication Information

Title:
Crystalline growth of AlN thin films by atomic layer deposition
Type:
Conference Proceedings
Info:
Journal of Physics: Conference Series 757 (2016) 012003
Date:
2016-09-06

Author Information

Name Institution
S SadeghpourKU Leuven
F CeyssensKU Leuven
R PuersKU Leuven

Films

Plasma AlN


Film/Plasma Properties

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Thickness
Analysis: Reflectometry

Characteristic: Thickness
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Substrates

Si(100)
Glass
Ti

Keywords

Notes

850