Comparative study of ALD SiO2 thin films for optical applications
Type:
Journal
Info:
Optical Materials Express, v. 6, n. 2, p. 660--670 (2016)
Date:
2016-01-18
Author Information
| Name | Institution |
|---|---|
| Kristin Pfeiffer | Friedrich-Schiller-Universität Jena |
| Svetlana Shestaeva | Fraunhofer Institute for Applied Optics and Precision Engineering |
| Astrid Bingel | Friedrich-Schiller-Universität Jena |
| Peter Munzert | Fraunhofer Institute for Applied Optics and Precision Engineering |
| Lilit Ghazaryan | Friedrich-Schiller-Universität Jena |
| Cristian Van Helvoirt | Eindhoven University of Technology |
| Erwin (W.M.M.) Kessels | Eindhoven University of Technology |
| Umut T. Sanli | Max Planck Institute for Intelligent Systems |
| Corinne Grévent | Max Planck Institute for Intelligent Systems |
| Gisela Schütz | Max Planck Institute for Intelligent Systems |
| Matti Putkonen | VTT Technical Research Centre |
| Iain Buchanan | Air Products |
| Lars Jensen | Laser Zentrum Hannover e.V. |
| Detlev Ristau | Laser Zentrum Hannover e.V. |
| Andreas Tünnermann | Friedrich-Schiller-Universität Jena |
| Adriana Szeghalmi | Friedrich-Schiller-Universität Jena |
Films
Plasma SiO2
Plasma SiO2
Thermal SiO2
Film/Plasma Properties
Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Optical Properties
Analysis: Optical Transmission
Characteristic: Optical Properties
Analysis: Optical Reflectivity
Characteristic: Optical Properties
Analysis: Laser Calorimetry
Substrates
| Si(100) |
| Ta2O5 |
| Lithosil Q1 |
| Glass, BK7 |
| Glass, B270 |
Notes
| 762 |