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Comparative study of ALD SiO2 thin films for optical applications

Type:
Journal
Info:
Optical Materials Express, v. 6, n. 2, p. 660--670 (2016)
Date:
2016-01-18
DOI:
http://dx.doi.org/10.1364/OME.6.000660

Author Information

Name Institution
Kristin PfeifferFriedrich-Schiller-Universität Jena
Svetlana ShestaevaFraunhofer Institute for Applied Optics and Precision Engineering
Astrid BingelFriedrich-Schiller-Universität Jena
Peter MunzertFraunhofer Institute for Applied Optics and Precision Engineering
Lilit GhazaryanFriedrich-Schiller-Universität Jena
Cristian Van HelvoirtEindhoven University of Technology
Erwin (W.M.M.) KesselsEindhoven University of Technology
Umut T. SanliMax Planck Institute for Intelligent Systems
Corinne GréventMax Planck Institute for Intelligent Systems
Gisela SchützMax Planck Institute for Intelligent Systems
Matti PutkonenVTT Technical Research Centre
Iain BuchananAir Products
Lars JensenLaser Zentrum Hannover e.V.
Detlev RistauLaser Zentrum Hannover e.V.
Andreas TünnermannFriedrich-Schiller-Universität Jena
Adriana SzeghalmiFriedrich-Schiller-Universität Jena

Films

Plasma SiO2

Hardware used: Oxford Instruments OpAL
3DMASi, (Me2N)3SiH, [(CH3)2N]3SiH, Tris(DiMethylAmido) Silane
CAS#: 15112-89-7
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range = 100-200C

Plasma SiO2

Hardware used: Oxford Instruments FlexAL
BDEAS, SAM-24, Bis(diethylamino)silane, (Et2N)2SiH2
CAS#: 27804-64-4
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 200C

Plasma SiO2

Hardware used: SENTECH
BDEAS, SAM-24, Bis(diethylamino)silane, (Et2N)2SiH2
CAS#: 27804-64-4
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 200C

Thermal SiO2

Hardware used: Picosun R200
AP-LTO 330
CAS#: 0-0-0
O3, Ozone
CAS#: 10028-15-6
Deposition Temperature = 200C

Film/Plasma Properties

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Diagnostic: Bruker D8 Advance

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: -

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Diagnostic: -

Characteristic: Optical Properties
Analysis: Optical Transmission
Diagnostic: PerkinElmer lambda 950 Spectrophotometer

Characteristic: Optical Properties
Analysis: Optical Reflectivity
Diagnostic: PerkinElmer lambda 950 Spectrophotometer

Characteristic: Optical Properties
Analysis: Laser Calorimetry
Diagnostic: -

Substrates

Si(100)
Ta2O5
Lithosil Q1
Glass, BK7
Glass, B270

Notes

762