Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Matti Putkonen Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Matti Putkonen returned 4 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Comparative study of ALD SiO2 thin films for optical applications
2Properties of AlN grown by plasma enhanced atomic layer deposition
3Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
4Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study