Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


AP-LTO 330, CAS# 0-0-0

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 4 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
2Comparative study of ALD SiO2 thin films for optical applications
3Modal properties of a strip-loaded horizontal slot waveguide
4Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications