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An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Andreas Tünnermann Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Andreas Tünnermann returned 10 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
2Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
3Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
4High-efficiency embedded transmission grating
5Composite materials and nanoporous thin layers made by atomic layer deposition
6Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
7Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
8Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
9Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
10Comparative study of ALD SiO2 thin films for optical applications