Publication Information

Title: Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material

Type: Conference Proceedings

Info: Proc. SPIE 9627, Optical Systems Design 2015: Advances in Optical Thin Films V, 96270Q (September 23, 2015)

Date: 2015-09-07

DOI: http://dx.doi.org/10.1117/12.2191283

Author Information

Name

Institution

Friedrich-Schiller-Universität Jena

Friedrich-Schiller-Universität Jena

Friedrich-Schiller-Universität Jena

Fraunhofer Institute for Applied Optics and Precision Engineering

Fraunhofer Institute for Applied Optics and Precision Engineering

Fraunhofer Institute for Applied Optics and Precision Engineering

Friedrich-Schiller-Universität Jena

Friedrich-Schiller-Universität Jena

Films

Plasma SiO2 using Unknown

Deposition Temperature Range = 100-300C

15112-89-7

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Unknown

Unknown

Refractive Index

Unknown

Unknown

Abrasion Resistance

Unknown

Unknown

Adhesion

Unknown

Unknown

Transmittance

Optical Transmission

Unknown

Substrates

Si(100)

Quartz

Glass, BK7

Keywords

AR, AntiReflective Coating

Notes

AR stack used HfO2 which may have been done with ALD.

513



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