Publication Information

Title: Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material

Type: Conference Proceedings

Info: Proc. SPIE 9627, Optical Systems Design 2015: Advances in Optical Thin Films V, 96270Q (September 23, 2015)

Date: 2015-09-07

DOI: http://dx.doi.org/10.1117/12.2191283

Author Information

Name

Institution

Friedrich-Schiller-Universität Jena

Friedrich-Schiller-Universität Jena

Friedrich-Schiller-Universität Jena

Fraunhofer Institute for Applied Optics and Precision Engineering

Fraunhofer Institute for Applied Optics and Precision Engineering

Fraunhofer Institute for Applied Optics and Precision Engineering

Friedrich-Schiller-Universität Jena

Friedrich-Schiller-Universität Jena

Films

Plasma SiO2 using Unknown

Deposition Temperature Range = 100-300C

15112-89-7

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Unknown

-

Refractive Index

Unknown

-

Abrasion Resistance

Unknown

-

Adhesion

Unknown

-

Transmittance

Optical Transmission

-

Substrates

Si(100)

Quartz

Glass, BK7

Keywords

AR, AntiReflective Coating

Notes

AR stack used HfO2 which may have been done with ALD.

513



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