Publication Information

Title:
Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
Type:
Conference Proceedings
Info:
Proc. SPIE 9627, Optical Systems Design 2015: Advances in Optical Thin Films V, 96270Q (September 23, 2015)
Date:
2015-09-07

Author Information

Name Institution
Kristin PfeifferFriedrich-Schiller-Universität Jena
Svetlana ShestaevaFriedrich-Schiller-Universität Jena
Astrid BingelFriedrich-Schiller-Universität Jena
Peter MunzertFraunhofer Institute for Applied Optics and Precision Engineering
Ulrike SchulzFraunhofer Institute for Applied Optics and Precision Engineering
Norbert KaiserFraunhofer Institute for Applied Optics and Precision Engineering
Andreas TünnermannFriedrich-Schiller-Universität Jena
Adriana SzeghalmiFriedrich-Schiller-Universität Jena

Films

Plasma SiO2


Film/Plasma Properties

Characteristic: Thickness
Analysis: -

Characteristic: Refractive Index
Analysis: -

Characteristic: Abrasion Resistance
Analysis: -

Characteristic: Adhesion
Analysis: -

Characteristic: Transmittance
Analysis: Optical Transmission

Substrates

Si(100)
Quartz
Glass, BK7

Keywords

AR, AntiReflective Coating

Notes

AR stack used HfO2 which may have been done with ALD.
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