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Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
Experimental and numerical analysis of the effects of ion bombardment in silicon oxide (SiO2) plasma enhanced atomic layer deposition (PEALD) processes
Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
Type:
Journal
Info:
Materials 2015, 8, 5425
Date:
2015-11-12
Author Information
| Name | Institution |
|---|---|
| Stephan Ratzsch | Friedrich-Schiller-Universität Jena |
| Ernst-Bernhard Kley | Friedrich-Schiller-Universität Jena |
| Andreas Tünnermann | Friedrich-Schiller-Universität Jena |
| Adriana Szeghalmi | Friedrich-Schiller-Universität Jena |
Films
Plasma TiO2
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Substrates
Keywords
| Substrate Biasing |
Notes
| 413 |