Title: Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
Type: Journal
Info: Materials 2015, 8, 5425
Date: 2015-11-12
DOI: http://dx.doi.org/10.3390/ma8115425
Name
Institution
Friedrich-Schiller-Universität Jena
Friedrich-Schiller-Universität Jena
Friedrich-Schiller-Universität Jena
Friedrich-Schiller-Universität Jena
Characteristic
Analysis
Diagnostic
Thickness
Ellipsometry
J.A. Woollam M-2000
Refractive Index
Ellipsometry
J.A. Woollam M-2000
Morphology, Roughness, Topography
SEM, Scanning Electron Microscopy
Hitachi S-4800 Field Emission Scanning Electron Microscope
Substrate Biasing
413
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