Publication Information

Title:
Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
Type:
Journal
Info:
Materials 2015, 8, 5425
Date:
2015-11-12

Author Information

Name Institution
Stephan RatzschFriedrich-Schiller-Universität Jena
Ernst-Bernhard KleyFriedrich-Schiller-Universität Jena
Andreas TünnermannFriedrich-Schiller-Universität Jena
Adriana SzeghalmiFriedrich-Schiller-Universität Jena

Films

Plasma TiO2


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy

Substrates

Keywords

Substrate Biasing

Notes

413