Publication Information

Title:
Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
Type:
Journal
Info:
Proc. SPIE 10691, Advances in Optical Thin Films VI, 106910E (5 June 2018)
Date:
2018-06-05

Author Information

Name Institution
Vivek BeladiyaFriedrich-Schiller-Universität Jena
Tahsin FarazEindhoven University of Technology
Erwin (W.M.M.) KesselsEindhoven University of Technology
Andreas TünnermannFriedrich-Schiller-Universität Jena
Adriana SzeghalmiFriedrich-Schiller-Universität Jena

Films

Plasma Al2O3


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Transmittance
Analysis: Spectrophotometry

Characteristic: Reflectance Spectra
Analysis: Spectrophotometry

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Density
Analysis: XRR, X-Ray Reflectivity

Characteristic: Morphology, Roughness, Topography
Analysis: XRR, X-Ray Reflectivity

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity

Characteristic: Chemical Composition, Impurities
Analysis: FTIR, Fourier Transform InfraRed spectroscopy

Characteristic: Stress
Analysis: Wafer Curvature

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Etch Rate
Analysis: Custom

Substrates

SiO2
Glass, BK7

Keywords

Substrate Biasing
Wet Etch Rate

Notes

1274