Publication Information

Title: Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing

Type: Journal

Info: Proc. SPIE 10691, Advances in Optical Thin Films VI, 106910E (5 June 2018)

Date: 2018-06-05

DOI: http://dx.doi.org/10.1117/12.2312516

Author Information

Name

Institution

Friedrich-Schiller-Universität Jena

Eindhoven University of Technology

Eindhoven University of Technology

Friedrich-Schiller-Universität Jena

Friedrich-Schiller-Universität Jena

Films

Deposition Temperature = 200C

75-24-1

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

J.A. Woollam M-2000D

Refractive Index

Ellipsometry

J.A. Woollam M-2000D

Transmittance

Spectrophotometry

PerkinElmer lambda 950 Spectrophotometer

Reflectance Spectra

Spectrophotometry

PerkinElmer lambda 950 Spectrophotometer

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Specs EA200

Density

XRR, X-Ray Reflectivity

Bruker-Axs D8 Advance diffractometer/reflectometer

Morphology, Roughness, Topography

XRR, X-Ray Reflectivity

Bruker-Axs D8 Advance diffractometer/reflectometer

Thickness

XRR, X-Ray Reflectivity

Bruker-Axs D8 Advance diffractometer/reflectometer

Chemical Composition, Impurities

FTIR, Fourier Transform InfraRed spectroscopy

Varian 3100 FTIR

Stress

Wafer Curvature

KLA-Tencor FLX 2320

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

Bruker Dimension 3100

Etch Rate

Custom

Custom

Substrates

SiO2

Glass, BK7

Keywords

Substrate Biasing

Wet Etch Rate

Notes

1274



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