Publication Information

Title:
Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
Type:
Journal
Info:
Nanotechnology 27 (2016) 255603
Date:
2016-04-26

Author Information

Name Institution
Lilit GhazaryanFriedrich-Schiller-Universität Jena
Ernst-Bernhard KleyFriedrich-Schiller-Universität Jena
Andreas TünnermannFriedrich-Schiller-Universität Jena
Adriana SzeghalmiFriedrich-Schiller-Universität Jena

Films

Plasma Al2O3


Plasma SiO2



Film/Plasma Properties

Characteristic: Porosity
Analysis: -

Characteristic: Refractive Index
Analysis: -

Substrates

Keywords

AR, AntiReflective Coating

Notes

827