Search 1531 plasma ALD publications by:
Search 1531 plasma ALD publications by:
Publication Information
Title:
Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
Type:
Journal
Info:
Nanotechnology 27 (2016) 255603
Date:
2016-04-26
Author Information
Name | Institution |
---|---|
Lilit Ghazaryan | Friedrich-Schiller-Universität Jena |
Ernst-Bernhard Kley | Friedrich-Schiller-Universität Jena |
Andreas Tünnermann | Friedrich-Schiller-Universität Jena |
Adriana Szeghalmi | Friedrich-Schiller-Universität Jena |
Films
Plasma Al2O3
Plasma SiO2
Plasma AlSixOy
Film/Plasma Properties
Characteristic: Porosity
Analysis: -
Characteristic: Refractive Index
Analysis: -
Substrates
Keywords
AR, AntiReflective Coating |
Notes
827 |
Popular Precursors
Top Authors
Erwin (W.M.M.) Kessels |
Hyeongtag Jeon |
Hyungjun Kim |
Mauritius C. M. (Richard) van de Sanden |
Christophe Detavernier |