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An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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AlSixOy Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing AlSixOy films returned 6 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition
2Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
3Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
4Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
5Composite materials and nanoporous thin layers made by atomic layer deposition
6Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition