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An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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AlSixOy Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing AlSixOy films returned 6 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
2Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition
3Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
4Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
5Composite materials and nanoporous thin layers made by atomic layer deposition
6Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy