Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells

Type:
Journal
Info:
J. Vac. Sci. Technol. A, Vol. 36, No. 1, Jan/Feb 2018
Date:
2017-10-25

Author Information

Name Institution
Takahiro ImaiYamagata University
Yoshiharu MoriYamagata University
Kensaku KanomataYamagata University
Masanori MiuraYamagata University
Bashir AhmmadYamagata University
Shigeru KubotaYamagata University
Fumihiko HiroseYamagata University

Films


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Surface Reactions
Analysis: IRAS, Infrared Reflection Absorption Spectroscopy

Characteristic: Photovoltaic Performance
Analysis: Custom

Substrates

TiO2
SnO2
Silicon

Notes

1127