Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
Type:
Journal
Info:
J. Vac. Sci. Technol. A, Vol. 36, No. 1, Jan/Feb 2018
Date:
2017-10-25
Author Information
Name | Institution |
---|---|
Takahiro Imai | Yamagata University |
Yoshiharu Mori | Yamagata University |
Kensaku Kanomata | Yamagata University |
Masanori Miura | Yamagata University |
Bashir Ahmmad | Yamagata University |
Shigeru Kubota | Yamagata University |
Fumihiko Hirose | Yamagata University |
Films
Plasma AlSixOy
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Surface Reactions
Analysis: IRAS, Infrared Reflection Absorption Spectroscopy
Characteristic: Photovoltaic Performance
Analysis: Custom
Substrates
TiO2 |
SnO2 |
Silicon |
Notes
1127 |