Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells

Type:
Journal
Info:
J. Vac. Sci. Technol. A, Vol. 36, No. 1, Jan/Feb 2018
Date:
2017-10-25
DOI:
http://dx.doi.org/10.1116/1.5002716

Author Information

Name Institution
Takahiro ImaiYamagata University
Yoshiharu MoriYamagata University
Kensaku KanomataYamagata University
Masanori MiuraYamagata University
Bashir AhmmadYamagata University
Shigeru KubotaYamagata University
Fumihiko HiroseYamagata University

Films

Plasma AlSixOy

Hardware used: Custom Remote Inductively Coupled Plasma
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
Where to buy precursor
3DMASi, (Me2N)3SiH, [(CH3)2N]3SiH, Tris(DiMethylAmido) Silane
CAS#: 15112-89-7
Where to buy precursor
H2O, Water
CAS#: 7732-18-5
Where to buy precursor
Deposition Temperature = 25C

Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: JASCO M-220

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: -

Characteristic: Surface Reactions
Analysis: IRAS, Infrared Reflection Absorption Spectroscopy
Diagnostic: Custom

Characteristic: Photovoltaic Performance
Analysis: Custom
Diagnostic: Custom

Substrates

TiO2
SnO2
Silicon

Notes

1127