Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Optical display film as flexible and light trapping substrate for organic photovoltaics

Type:
Journal
Info:
Optics Express, v. 24, n. 10, p. A974--A980 (2016)
Date:
2016-04-16
DOI:
http://dx.doi.org/10.1364/OE.24.00A974

Author Information

Name Institution
Yoonseok ParkTechnische Universität Dresden
Frederik NehmTechnische Universität Dresden
Lars Müller-MeskampTechnische Universität Dresden
Koen VandewalTechnische Universität Dresden
Karl LeoTechnische Universität Dresden

Films

Plasma Al2O3

Hardware used: SENTECH
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 100C

Film/Plasma Properties

Substrates

PEN, Polyethylene Napthalate

Notes

1152