Publication Information

Title: Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties

Type: Journal

Info: J. Vac. Sci. Technol. A 33(1), Jan/Feb 2015

Date: 2014-12-01

DOI: http://dx.doi.org/10.1116/1.4903938

Author Information

Name

Institution

Chittaranjan Das

Brandenburg University of Technology

Films

Plasma TiO2 using SENTECH

Deposition Temperature = 200C

TTIP, Titanium(IV) i-propoxide

546-68-9

Where to buy precursor

O2, Oxygen

7782-44-7

Thermal TiO2 using SENTECH

Deposition Temperature = 200C

TTIP, Titanium(IV) i-propoxide

546-68-9

Where to buy precursor

H2O, Water

7732-18-5

Thermal TiO2 using Custom

Deposition Temperature = 250C

TTIP, Titanium(IV) i-propoxide

546-68-9

Where to buy precursor

H2O, Water

7732-18-5

Thermal TiO2 using Custom

Deposition Temperature = 300C

Titanium(IV) methoxide, Ti(OMe)4

992-92-7

Where to buy precursor

H2O, Water

7732-18-5

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Substrates

Keywords

Notes

236


Mark Sowa

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