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Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
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Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
Type:
Journal
Info:
J. Vac. Sci. Technol. A 33(1), Jan/Feb 2015
Date:
2014-12-01
Author Information
| Name | Institution |
|---|---|
| Chittaranjan Das | Brandenburg University of Technology |
Films
Film/Plasma Properties
Substrates
Keywords
Notes
| 236 |