Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties

Type:
Journal
Info:
J. Vac. Sci. Technol. A 33(1), Jan/Feb 2015
Date:
2014-12-01
DOI:
http://dx.doi.org/10.1116/1.4903938

Author Information

Name Institution
Chittaranjan DasBrandenburg University of Technology

Films

Plasma TiO2

Hardware used: SENTECH
TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)4
CAS#: 546-68-9
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 200C

Thermal TiO2

Hardware used: SENTECH
TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)4
CAS#: 546-68-9
Where to buy precursor
H2O, Water
CAS#: 7732-18-5
Where to buy precursor
Deposition Temperature = 200C

Thermal TiO2

Hardware used: Custom
TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)4
CAS#: 546-68-9
Where to buy precursor
H2O, Water
CAS#: 7732-18-5
Where to buy precursor
Deposition Temperature = 250C

Thermal TiO2

Hardware used: Custom
Titanium(IV) methoxide, Ti(OMe)4
CAS#: 992-92-7
Where to buy precursor
H2O, Water
CAS#: 7732-18-5
Where to buy precursor
Deposition Temperature = 300C

Film/Plasma Properties

Substrates

Notes

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