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Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
Experimental and numerical analysis of the effects of ion bombardment in silicon oxide (SiO2) plasma enhanced atomic layer deposition (PEALD) processes
Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
Type:
Journal
Info:
Nanoscale Research Letters 2014, 9:223
Date:
2014-04-11
Author Information
| Name | Institution |
|---|---|
| Tim Bulow | Technische Universität Braunschweig |
| Hassan Gargouri | Sentech Instruments GmbH |
| Mirko Siebert | Sentech Instruments GmbH |
| Rolf Rudolph | Sentech Instruments GmbH |
| Hans-Hermann Johannes | Technische Universität Braunschweig |
| Wolfgang Kowalsky | Technische Universität Braunschweig |
Films
Film/Plasma Properties
Characteristic: Water Vapor Transmission Rate (WVTR)
Analysis: Calcium Test
Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Substrates
| PEN, Polyethylene Napthalate |
Keywords
| Diffusion Barrier |
Notes
| 218 |