Publication Information

Title: Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor

Type: Journal

Info: Nanoscale Research Letters 2014, 9:223

Date: 2014-04-11

DOI: http://dx.doi.org/10.1186/1556-276X-9-223

Author Information

Name

Institution

Tim Bulow

Technische Universität Braunschweig

Films

Plasma Al2O3 using SENTECH

Deposition Temperature = 80C

TMA, Trimethyl Aluminum, Trimethylalane, Trimethylaluminium, Aluminium Trimethyl, Aluminum Trimethanide, Al(CH3)3, AlMe3, Al2(CH3)6, Al2Me6

75-24-1

Where to buy precursor

Oxygen, O2

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Substrates

Keywords

Notes

218


Mark Sowa

Shortcuts

Films
Precursors
Deposition Hardware
Authors
Film and Plasma Characteristics
Multi-factor Search
ALD and PEALD Background
On-line PEALD Theses
About plasma-ald.com

Contact Us
ALD Links

© 2014-2018 plasma-ald.com