Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Flexible, light trapping substrates for organic photovoltaics

Type:
Journal
Info:
Applied Physics Letters 109, 9 (2016)
Date:
2016-08-23
DOI:
http://dx.doi.org/10.1063/1.4962206

Author Information

Name Institution
Yoonseok ParkDresden Integrated Center on Applied Physics and Photonics Materials (IAPP)
Jana BergerFraunhofer Institute for Material and Beam Technology IWS Dresden
Zheng TangDresden Integrated Center on Applied Physics and Photonics Materials (IAPP)
Lars Müller-MeskampDresden Integrated Center on Applied Physics and Photonics Materials (IAPP)
Andrés Fabián LasagniFraunhofer Institute for Material and Beam Technology IWS Dresden
Koen VandewalDresden Integrated Center on Applied Physics and Photonics Materials (IAPP)
Karl LeoDresden Integrated Center on Applied Physics and Photonics Materials (IAPP)

Films

Plasma Al2O3

Hardware used: SENTECH
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 100C

Film/Plasma Properties

Substrates

Notes

859