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Development and characterization of an atmospheric pressure plasma reactor compatible with spatial ALD
ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
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Publication Information
Title:
Flexible, light trapping substrates for organic photovoltaics
Type:
Journal
Info:
Applied Physics Letters 109, 9 (2016)
Date:
2016-08-23
Author Information
| Name | Institution |
|---|---|
| Yoonseok Park | Dresden Integrated Center on Applied Physics and Photonics Materials (IAPP) |
| Jana Berger | Fraunhofer Institute for Material and Beam Technology IWS Dresden |
| Zheng Tang | Dresden Integrated Center on Applied Physics and Photonics Materials (IAPP) |
| Lars Müller-Meskamp | Dresden Integrated Center on Applied Physics and Photonics Materials (IAPP) |
| Andrés Fabián Lasagni | Fraunhofer Institute for Material and Beam Technology IWS Dresden |
| Koen Vandewal | Dresden Integrated Center on Applied Physics and Photonics Materials (IAPP) |
| Karl Leo | Dresden Integrated Center on Applied Physics and Photonics Materials (IAPP) |
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Notes
| 859 |
Popular Precursors
Top Authors
| Erwin (W.M.M.) Kessels |
| Hyeongtag Jeon |
| Hyungjun Kim |
| Mauritius C. M. (Richard) van de Sanden |
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