2021 Year in Review
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Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
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Flexible, light trapping substrates for organic photovoltaics
Type:
Journal
Info:
Applied Physics Letters 109, 9 (2016)
Date:
2016-08-23
Author Information
| Name | Institution |
|---|---|
| Yoonseok Park | Dresden Integrated Center on Applied Physics and Photonics Materials (IAPP) |
| Jana Berger | Fraunhofer Institute for Material and Beam Technology IWS Dresden |
| Zheng Tang | Dresden Integrated Center on Applied Physics and Photonics Materials (IAPP) |
| Lars Müller-Meskamp | Dresden Integrated Center on Applied Physics and Photonics Materials (IAPP) |
| Andrés Fabián Lasagni | Fraunhofer Institute for Material and Beam Technology IWS Dresden |
| Koen Vandewal | Dresden Integrated Center on Applied Physics and Photonics Materials (IAPP) |
| Karl Leo | Dresden Integrated Center on Applied Physics and Photonics Materials (IAPP) |
Films
Film/Plasma Properties
Substrates
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| Encapsulation |
Notes
| 859 |