The publication database currently has 1695 entries.
Use Advanced Search for more complex searches
Recent Database Additions
Infrared single-photon sensitivity in atomic layer deposited superconducting nanowires
Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
Gallium nitride thin films by microwave plasma-assisted ALD
Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition
Hydrogen-induced abstraction mechanism of surface methyl groups in atomic-layer-epitaxy of germanium
Flexible, light trapping substrates for organic photovoltaics
Type:
Journal
Info:
Applied Physics Letters 109, 9 (2016)
Date:
2016-08-23
Author Information
| Name | Institution |
|---|---|
| Yoonseok Park | Dresden Integrated Center on Applied Physics and Photonics Materials (IAPP) |
| Jana Berger | Fraunhofer Institute for Material and Beam Technology IWS Dresden |
| Zheng Tang | Dresden Integrated Center on Applied Physics and Photonics Materials (IAPP) |
| Lars Müller-Meskamp | Dresden Integrated Center on Applied Physics and Photonics Materials (IAPP) |
| Andrés Fabián Lasagni | Fraunhofer Institute for Material and Beam Technology IWS Dresden |
| Koen Vandewal | Dresden Integrated Center on Applied Physics and Photonics Materials (IAPP) |
| Karl Leo | Dresden Integrated Center on Applied Physics and Photonics Materials (IAPP) |
Films
Film/Plasma Properties
Substrates
Notes
| 859 |